A Novel Hysteresis Characterization Model for Gas-Dependent MoS2 Field Effect Transistors
In this investigation, a new and completely original mathematical model was developed, which is capable of characterizing hysteresis in Molybdenum disulfide MoS2 MOSFET (Metal-Oxide Semiconductor Field effect transistor) transistors, thus allowing to predict, the future behavior of the device.
Regarding hysteresis, it is a phenomenon present in several fields of science and engineering. The study of this phenomenon plays an important role in research and technological development, through understanding the phenomenology of certain devices. The downside is that hysteresis can reduce carriers mobility, significantly impairing transistor performance. On the positive side, hysteresis can be used conveniently in the construction, for instance, of memories. Also, through a bibliographical review, it was possible to verify that to date there is no model in the scientific literature that characterizes hysteresis in FET (Field effect transistor) Molybdenum disulfide MoS2 transistors. Thus, this new modeling is pioneer in the description of the hysteretic phenomenon in FET (Field effect transistor) MoS2 transistors.